ʻO ka ʻenehana hoʻoheheʻe kino kino (Physical Vapor Deposition, PVD) ka ʻenehana i ka hoʻohana ʻana i nā ʻano hana kino ma lalo o nā kūlana ʻawaʻawa e hoʻoheheʻe i ka ʻili o kahi kumu waiwai (paʻa a wai paha) i loko o nā mana kinoea a i ʻole nā molekole, a i ʻole ka ionize ʻāpana i loko o nā ion, a hele i ke kinoea haʻahaʻa haʻahaʻa (a i ʻole plasma). Kaʻina hana, kahi ʻenehana no ka waiho ʻana i kahi kiʻiʻoniʻoni lahilahi me kahi hana kūikawā ma ka ʻili o kahi substrate, a ʻo ka waiho ʻana o ka mahu kino kekahi o nā ʻenehana lapaʻau nui. ʻO ka PVD (physical vapor deposition) ka ʻenehana uhi ʻana ua māhele ʻia i ʻekolu mau ʻāpana: ka uhi ʻana o ka hoʻoheheʻe ʻana, ka uhi ʻana a me ka uhi ʻana o ka ion.
Hoʻohana nui ʻia kā mākou huahana i ka evaporation thermal a me ka sputtering coating. ʻO nā huahana i hoʻohana ʻia i ka hoʻoheheʻe ʻana i ka mahu, ʻo ia ka uea tungsten strand, nā moku tungsten, nā moku molybdenum, a me nā waʻa tantalum nā huahana i hoʻohana ʻia i ka uhi ʻana i ka electron beam coating he cathode tungsten wire, copper crucible, tungsten crucible, a me nā ʻāpana hana molybdenum ʻO nā huahana i hoʻohana ʻia i ka sputtering coating e loaʻa nā pahu pahu titanium, tichromanium target.
